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    gapa053
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    Nickel Vanadium (Ni/V) Sputtering Target, Monolithic, Planar, Cathodic ARC, PVD Coating, Thin Film Deposition, Magnetron NiV7 Sputtering Targets Manufacturer And Supplier
    NICKEL VANADIUM(Ni/V) SPUTTERING TARGET
    Nickel plus 7wt% Vanadium (NiV7) is one of the most important thin film sputtering alloy in the field of Semiconductors. It features the desirable chemical, electrical and optical properties of pure Ni, with the added advantage to be not ferromagnetic. Because of the non-ferromagnetic property, it is easy to use in high-rate magnetron sputtering equipment. NiV7 coatings applications include resistive films, diffusion barriers, and prewetting layers for advanced packaging, e.g. Flip-Chip technology etc.

    Haohai Metal, as one of the top leading manufacturer of coating materials for physical vapor deposition (PVD) coating industry more than 15 years, with well-equipped modem plant and rich experience, our sputtering targets and evaporation materials won high reputation in worldwide.
    Haohai Metal’s NiV sputtering targets include rectangle sputtering targets, circular sputtering targets and cathodic targets.
    Nickel Vanadium Planar (Rectangle, Circular) Sputtering Target
    Manufacturing Range
    RectangleLength (mm)Width (mm)Thickness (mm)Custom Made
    10 – 200010 – 6001.0 – 25
    CircularDiameter (mm)
    Thickness (mm)
    10 – 400
    1.0 – 25

    Specification
    Composition [wt%]NiV, 93/7
    Purity3N (99.9%), 3.5N (99.95%)
    Density8.90 g/cm3
    Grain Sizes< 80 micron or on request
    Fabrication ProcessesVacuum Melted, Casting, Machining
    ShapePlate, Disc, Step, Down bolting, Threading, Custom Made
    TypeMonolithic, Multi-segmented Target, Bonding
    SurfaceRa 1.6 micron or on request

    Other Specifications
    ✦ We make sure the same grain direction in the multi-segmented construction parts.
    ✦ Flatness, clean surface, polished, free of crack, oil, dot, etc.
    ✦ High ductility, high thermal conductivity, homogeneous microstructure and high purity etc.
    Nickel Vanadium Arc Cathodes
    We supply Nickel Vanadium planar arc cathodes as well as Nickel Vanadium planar sputtering targets
    For our Nickel Vanadium Sputtering Targets and Arc Cathodes
    Tolerance
    ✦ Vanadium content is held at +0.5 / -0.3 wt%.
    ✦ The vanadiu is 100% atomically solved within the nickel matrix, this guarantees non ferromagnetic properties and excellent sputtering performance.
    ✦ Others could be acc. to drawings or request.
    Impurities Content [ppm]
    Nickel Vanadium Purity [%]Elements93/7 wt%, 3N5
    [99.95]
    Metallic Impurities [μg/g]Ag5
    Al100
    Ca1
    Co75
    Cr45
    Cu15
    Fe75
    K
    1
    Li1
    Mg50
    Mn5
    Mo75
    Na1
    Si200
    Ti50
    Non-Metallic Impurities [μg/g]C20
    N50
    O200
    S5
    Guaranteed Density [g/cm3]8.90
    Grain Size [μm]80
    Thermal Conductivity [W/(m.K)]-
    Coefficient of thermal expansion [1/K]-
    Analytical Methods:
    1. Metallic elements were analyzed using GDMS (Precision and bias typical of GDMS measurements are discussed under ASTM F1593).
    2. Gas elements were analyzed using LECO GAS ANALYZER .
    ✦ C,S determined by Combustion-lR
    ✦ N,H determined by IGF-TC
    ✦ O determined by IGF-NDIR
    ✦ X-ray Fluorescence Spectrometry (XRF)
    ✦ Matallographic investigation
    Application
    ✦ Solar & Photovoltaic Industry
    ✦ Semiconductorshigh quality backing plate sputtering target
    website:http://www.pvdtarget.com/alloy-sputtering-targets/

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